Success Stories: NIW Petition Approved for Materials Science Professor Following RFE and NOID Responses, Highlighting Both CSPA-Related Urgency and Groundbreaking Research in High-Entropy Ceramics

Client’s Testimonial:

“Thank you very much for all the help provided during this process!”

On August 13^th, 2025, we received another EB-2 NIW (National Interest Waiver) approval for a Professor in the Field of Materials Science (Approval Notice).

General Field: Materials Science

Position at the Time of Case Filing: Professor

Approval Notice Date: August 13^th, 2025

Processing Time: 1 year, 3 months, 21 days (Premium Processing Requested)

Case Summary:

An EB-2 NIW (National Interest Waiver) petition prepared by NAILG was recently approved for a materials science professor. This case is especially notable because it was filed under urgent circumstances in an effort to maximize the possibility of protecting the client’s dependent child under the Child Status Protection Act (CSPA). At the time of filing, the client was engaged in pioneering research on high-entropy ceramics with optimized electrical insulation and corrosion resistance. His proposed endeavor aims to advance applications in semiconductors, energy systems, and high-temperature industrial tools, an area of clear, substantial merit and national importance.

Case Challenges
The case began with a one-page petition letter, filed promptly to secure timely submission, with the understanding that additional evidence would be provided later. As expected, the petition came under close scrutiny by USCIS. On February 11, 2025, the agency issued a Request for Evidence (RFE) questioning whether the proposed endeavor met the NIW criteria. Although a detailed response was submitted, USCIS followed with a Notice of Intent to Deny (NOID) on June 4, 2025, disputing all three prongs under Matter of Dhanasar. These challenges added to the complexity of the case, particularly given the urgency surrounding potential CSPA implications.

Responding with Substantive Evidence
In response to the RFE and NOID, NAILG submitted a robust evidentiary record that demonstrated both the client’s sustained achievements and the national importance of his work. Highlights included:

Over 340 peer-reviewed journal articles published in leading scientific outlets.
More than 16,500 citations, with several works ranking among the top 1% most-cited papers worldwide.
30+ peer reviews completed and service on editorial boards, reflecting recognition in the scientific community.
Independent expert testimonials confirming the role of his research in advancing semiconductors, energy storage, and advanced manufacturing.

This evidence demonstrated that the client not only made significant original contributions to materials science but is also well-positioned to continue advancing U.S. leadership in critical technologies.

NIW Approval and Outlook
Ultimately, USCIS was persuaded by the comprehensive responses and approved the petition. While CSPA outcomes are inherently uncertain and cannot be guaranteed, this case illustrates how timely filing, followed by carefully crafted responses to both an RFE and a NOID, can secure the strongest possible position for a family facing complex circumstances. With NAILG’s support, the client not only achieved NIW approval but also maximized the chance of protecting his child’s eligibility under CSPA. He is now well-positioned to continue groundbreaking research in materials science, driving advancements that will strengthen U.S. capabilities in semiconductors, energy, and industrial technology.

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North America Immigration Law Group (Chen Immigration Law Associates) is a U.S. immigration law firm dedicated to representing corporations, research institutions, and individuals from all 50 U.S. states regarding I-140 immigration petitions. We specialize in employment-based immigration petition and have a proven record of high success rate for the categories of: EB2-NIW (National Interest Waiver), EB1-A (Alien of Extraordinary Ability), EB1-B (Outstanding Researcher/Professor) and O-1 (Alien of Extraordinary Ability).

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